Pnictide buffer structures and devices for GaN base applications
US10615141B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2017 |
| Grant date | Apr 7, 2020 |
| Priority date | — |
| Expiry date | Jun 2, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2301/17
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A structure can include a III-N layer with a first lattice constant, a first rare earth pnictide layer with a second lattice constant epitaxially grown over the III-N layer, a second rare earth pnictide layer with a third lattice constant epitaxially grown over the first rare earth pnictide layer, and a semiconductor layer with a fourth lattice constant epitaxially grown over the second rare earth pnictide layer. A first difference between the first lattice constant and the second lattice constant and a second difference between the third lattice constant and the fourth lattice constant are less than one percent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.