Patent · US Active

Pnictide buffer structures and devices for GaN base applications

US10615141B2 · kind B2 · utility

0Cited by
3References
15Claims
0Family size

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Key dates

Filing dateJun 2, 2017
Grant dateApr 7, 2020
Priority date
Expiry dateJun 2, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S2301/17
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A structure can include a III-N layer with a first lattice constant, a first rare earth pnictide layer with a second lattice constant epitaxially grown over the III-N layer, a second rare earth pnictide layer with a third lattice constant epitaxially grown over the first rare earth pnictide layer, and a semiconductor layer with a fourth lattice constant epitaxially grown over the second rare earth pnictide layer. A first difference between the first lattice constant and the second lattice constant and a second difference between the third lattice constant and the fourth lattice constant are less than one percent.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.