Apparatus and method for aligning integrated circuit layers using multiple grating materials
US10635007B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2018 |
| Grant date | Apr 28, 2020 |
| Priority date | — |
| Expiry date | Nov 13, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2223/54453
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the disclosure provides an apparatus for aligning layers of an integrated circuit (IC), the apparatus including: an insulator layer positioned above a semiconductor substrate; a first diffraction grating within a first region of the insulator layer, the first diffraction grating including a first grating material within the first region of the insulator layer; and a second diffraction grating within a second region of the insulator layer, the second grating including a second grating material within the second region of the insulator layer, wherein the second grating material is different from the first grating material, and wherein an optical contrast between the first and second grating materials is greater than an optical contrast between the second grating material and the insulator layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.