Lithographic apparatus
US10649341B2 · kind B2 · utility
0Cited by
4References
22Claims
0Family size
Assignee
Inventors
- Clemens Johannes Gerardus Van Den Dungen
- Nicolaas Franciscus Koppelaars
- Martinus Hendrikus Antonius Leenders
- Paulus Martinus Maria Liebregts
- Johannes Catharinus Hubertus Mulkens
- Erik Henricus Egidius Catharina Eummelen
- Marcel Beckers
- Richard Moerman
- Cédric Désiré Grouwstra
- Danny Maria Hubertus Philips
- Remko Jan Peter Verhees
- Pieter Mulder
- Evert Van Vliet
Key dates
| Filing date | Oct 6, 2016 |
| Grant date | May 12, 2020 |
| Priority date | — |
| Expiry date | Oct 17, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.