Spin chuck with concentrated center and radial heating

US10658204B2 · kind B2 · utility

Assignee

• Lam Research Corporation · US

Inventors

• Bridget Hill · Yanchep, AU
• Michael PUGGL · Zeltweg, AT
• Gerhard Mueller · Meitingen, DE
• Henry Roger Osner · Yanchep, AU
• Karl-Heinz Hohenwarter · Kötschach, AT
• Ulrich Tschinderle · Finkenstein, AT
• Daniel Brien · Villach, AT

Key dates

• Filing date: Aug 8, 2017
• Grant date: May 19, 2020
• Expiry date: Apr 5, 2038

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6875
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A substrate processing system to treat a substrate includes a spin chuck configured to hold and rotate a substrate. A heating assembly is configured to heat an opposite surface of the substrate and includes a main heater assembly and a nozzle stack cap. The main heater assembly includes a first plurality of light emitting diodes (LEDs) arranged on a first printed circuit board (PCB) in a first plane that is spaced from and parallel to a second plane including the substrate. The nozzle stack cap assembly includes at least one nozzle to dispense liquid onto a center of a first surface of the substrate. A radiant heat source is arranged closer to the substrate than the first plane and is configured to heat the center of the first surface of the substrate.