Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US10681795B2 · kind B2 · utility
1Cited by
4References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 13, 2019 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | Feb 13, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.