Patent · US Active

Gas flow guide design for uniform flow distribution and efficient purge

US10697062B2 · kind B2 · utility

2Cited by
2References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 11, 2018
Grant dateJun 30, 2020
Priority date
Expiry dateJul 11, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45591
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.