ShouQian Shao
18Patents
5h-index
37Co-inventors
66Inventor score
Filing activity: Aug 16, 2001 → Nov 15, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8821985B2 | Method and apparatus for high-K gate performance improvement and combinatorial processing | Performing Operations; Transporting | 324 | Active |
| US6872909B2 | Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel | Electricity | 40 | Expired |
| US6437290B1 | Heat treatment apparatus having a thin light-transmitting window | Chemistry; Metallurgy | 25 | Expired |
| US8613863B2 | Methods for selective etching of a multi-layer substrate | Electricity | 13 | Active |
| US7501600B2 | Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel | Electricity | 9 | Active |
| US8733280B2 | Showerhead for processing chamber | Chemistry; Metallurgy | 4 | Active |
| US10697062B2 | Gas flow guide design for uniform flow distribution and efficient purge | Chemistry; Metallurgy | 2 | Active |
| US7914603B2 | Particle trap for a plasma source | Emerging Cross-Sectional Technologies | 1 | Active |
| US8974649B2 | Combinatorial RF bias method for PVD | Electricity | 1 | Active |
| US9330928B2 | Methods for selective etching of a multi-layer substrate | Electricity | 1 | Active |
| US8925481B2 | Systems and methods for measuring, monitoring and controlling ozone concentration | Emerging Cross-Sectional Technologies | 1 | Active |
| US8851010B2 | Systems and methods for measuring, monitoring and controlling ozone concentration | Emerging Cross-Sectional Technologies | 0 | Active |
| US9023438B2 | Methods and apparatus for combinatorial PECVD or PEALD | Chemistry; Metallurgy | 0 | Active |
| US12080516B2 | High density plasma enhanced process chamber | Electricity | 0 | Active |
| US9175382B2 | High metal ionization sputter gun | Electricity | 0 | Active |
| US11929236B2 | Methods of tuning to improve plasma stability | Electricity | 0 | Active |
| US11967516B2 | Substrate support for chucking of mask for deposition processes | Electricity | 0 | Active |
| US12394595B2 | Multi-antenna unit for large area inductively coupled plasma processing apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.