Asymmetric overlay mark for overlay measurement

US10707175B2 · kind B2 · utility

Assignee

• GlobalFoundries Inc. · KY

Inventors

• Wei Zhao · Zhuhai, CN
• Minghao Tang · Ballston Lake, US
• Rui Chen · Jiexi, CN
• Dongyue Yang · Lawrenceville, US
• Haiting Wang · Clifton Park, US
• Erik Geiss · Wappingers Falls, US
• Scott Beasor · Greenwich, US

Key dates

• Filing date: May 22, 2018
• Grant date: Jul 7, 2020
• Expiry date: Jan 24, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L2223/5446
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

One illustrative example of an overlay mark disclosed herein includes four quadrants (I-IV). Each quadrant of the mark contains an inner periodic structure and an outer periodic structure. Each of the outer periodic structures includes a plurality of outer features. Each of the inner periodic structures includes a plurality of first inner groups, each of the first inner groups having a plurality of first inner features, each first inner group being oriented such that there is an end-to-end spacing relationship between each first inner group and a selected one of the outer features.