Semiconductor processing chamber
US10741428B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2017 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Jun 16, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32899
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A semiconductor processing apparatus is described that has a body with a wall defining two processing chambers within the body; a passage through the wall forming a fluid coupling between the two processing chambers; a lid removably coupled to the body, the lid having a portal in fluid communication with the passage; a gas activator coupled to the lid outside the processing chambers, the gas activator having an outlet in fluid communication with the portal of the lid; a substrate support disposed in each processing chamber, each substrate support having at least two heating zones, each with an embedded heating element; a gas distributor coupled to the lid facing each substrate support; and a thermal control member coupled to the lid at an edge of each gas distributor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.