Method and system for determining a charged particle beam exposure for a local pattern density
US10748744B1 · kind B1 · utility
4Cited by
20References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2019 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | May 24, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes inputting an original set of exposure information for the area and inputting a target post-proximity effect correction (PEC) maximum dose. A local pattern density is calculated for the area of the pattern based on the original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PEC maximum dose.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.