Ryan Pearman
12Patents
3h-index
12Co-inventors
53Inventor score
Filing activity: Mar 18, 2013 → Aug 3, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9038003B2 | Method and system for critical dimension uniformity using charged particle beam lithography | Physics | 10 | Active |
| US10460071B2 | Shaped beam lithography including temperature effects | Electricity | 4 | Active |
| US10748744B1 | Method and system for determining a charged particle beam exposure for a local pattern density | Electricity | 4 | Active |
| US11062878B2 | Method and system for determining a charged particle beam exposure for a local pattern density | Electricity | 3 | Active |
| US11756765B2 | Method and system for determining a charged particle beam exposure for a local pattern density | Electricity | 1 | Active |
| US9104109B2 | Method and system for improving critical dimension uniformity using shaped beam lithography | Electricity | 1 | Active |
| US12243712B2 | Method and system for determining a charged particle beam exposure for a local pattern density | Electricity | 0 | Active |
| US9046761B2 | Lithography mask having sub-resolution phased assist features | Physics | 0 | Active |
| US11592802B2 | Method and system of reducing charged particle beam write time | Electricity | 0 | Active |
| US11886166B2 | Method and system of reducing charged particle beam write time | Electricity | 0 | Active |
| US10884395B2 | Method and system of reducing charged particle beam write time | Electricity | 0 | Active |
| US11604451B2 | Method and system of reducing charged particle beam write time | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.