Apparatus and methods to remove residual precursor inside gas lines post-deposition
US10752990B2 · kind B2 · utility
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6References
16Claims
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Key dates
| Filing date | Mar 28, 2017 |
| Grant date | Aug 25, 2020 |
| Priority date | — |
| Expiry date | Mar 28, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/3115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus and methods for supplying a gas to a processing chamber are described. The apparatus comprises an inlet line and an outlet line, each with two valves, in fluid communication an ampoule. A bypass line connects the inlet valve and outlet valve closest to the ampoule. The apparatus and methods of use allow a precursor residue to be removed from the delivery lines of a processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.