Daping Yao
15Patents
3h-index
32Co-inventors
56Inventor score
Filing activity: Jun 1, 2011 → Jun 17, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9460959B1 | Methods for pre-cleaning conductive interconnect structures | Mechanical Engineering; Lighting; Heating | 113 | Active |
| US9364871B2 | Method and hardware for cleaning UV chambers | Chemistry; Metallurgy | 4 | Active |
| US9506145B2 | Method and hardware for cleaning UV chambers | Chemistry; Metallurgy | 3 | Active |
| US10600685B2 | Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film | Electricity | 2 | Active |
| US8664126B2 | Selective deposition of polymer films on bare silicon instead of oxide surface | Electricity | 2 | Active |
| US11854794B2 | Semiconductor cleaning equipment and method for cleaning through vias using the same | Electricity | 0 | Active |
| US10752990B2 | Apparatus and methods to remove residual precursor inside gas lines post-deposition | Emerging Cross-Sectional Technologies | 0 | Active |
| US10640870B2 | Gas feedthrough assembly | Chemistry; Metallurgy | 0 | Active |
| US10453657B2 | Apparatus for depositing metal films with plasma treatment | Electricity | 0 | Active |
| US11059061B2 | Apparatus for increasing flux from an ampoule | Electricity | 0 | Active |
| US10283345B2 | Methods for pre-cleaning conductive materials on a substrate | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US8492177B2 | Methods for quantitative measurement of a plasma immersion process | Electricity | 0 | Active |
| US11133155B2 | Apparatus for depositing metal films with plasma treatment | Electricity | 0 | Active |
| US11628456B2 | Apparatus for increasing flux from an ampoule | Electricity | 0 | Active |
| US9478437B2 | Methods for repairing low-k dielectrics using carbon plasma immersion | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.