Patent · US Active

Fall-proof apparatus for cleaning semiconductor devices and a chamber with the apparatus

US10770315B2 · kind B2 · utility

0Cited by

17References

26Claims

0Family size

Assignee

ACM RESEARCH (SHANGHAI), INC. · CN

Inventors

Zhenming Chu · Shanghai, CN
Xi Wang · Shanghai, CN
Hui Wang · Shanghai, CN
Shena Jia · Shanghai, CN
Jun Wu · Shanghai, CN
Fuping Chen · Shanghai, CN
Xuejun Li · Shanghai, CN

Key dates

Filing date	Sep 8, 2015
Grant date	Sep 8, 2020
Priority date	—
Expiry date	Jul 29, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/14
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A fall-proof apparatus for cleaning semiconductor devices is provided. The fall-proof apparatus comprises: a nozzle (102) connecting with a carrier (101); a megasonic/ultrasonic device (105) fixing on the carrier (101); and a sensor (104) detecting the distance between the megasonic/ultrasonic device (105) and the carrier (101) to determine whether the megasonic/ultrasonic device (105) is loose and going to fall. The megasonic/ultrasonic device works with the nozzle during a cleaning process. A chamber with the fall-proof apparatus is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.