System and method for detecting etch depth of angled surface relief gratings
US10775158B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 4, 2019 |
| Grant date | Sep 15, 2020 |
| Priority date | — |
| Expiry date | Jan 4, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.