Double pass diluted ultraviolet reticle inspection
US10816483B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2018 |
| Grant date | Oct 27, 2020 |
| Priority date | — |
| Expiry date | Jun 6, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A reticle inspection system and related method are disclosed. The system includes a concave spherical mirror positioned adjacent a side of the reticle that is configured to reflect inspection light transmitted through the reticle back towards and through the reticle. A sensor is configured to create at least one of: a first inspection image representative of a circuit pattern of the reticle based on transmission of the inspection light through the first side of the reticle and a reflection thereof by the concave spherical mirror through the second side of the reticle, and a second inspection image representative of the circuit pattern of the reticle based on the reflection of the inspection light from the first side of the reticle. A controller is configured to identify a defect in the reticle based on at least one of the first inspection image and the second inspection image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.