Standby port and substrate processing apparatus having the same
US10825699B2 · kind B2 · utility
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1References
8Claims
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Key dates
| Filing date | Dec 19, 2018 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | Mar 1, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6835
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.