Heehwan Kim
9Patents
1h-index
29Co-inventors
43Inventor score
Filing activity: Dec 4, 2012 → Oct 30, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10109506B2 | Unit for supplying fluid, apparatus and method for treating substrate with the unit | Electricity | 6 | Active |
| US10707101B2 | Substrate treating apparatus and substrate treating method | Electricity | 0 | Active |
| US11424139B2 | Apparatus and method for treating substrate, and nozzle unit | Electricity | 0 | Active |
| US11280753B2 | Sensors for detecting substitution between chemicals and methods of manufacturing a semiconductor device using the sensor | Electricity | 0 | Active |
| US10825699B2 | Standby port and substrate processing apparatus having the same | Electricity | 0 | Active |
| US10304687B2 | Substrate treating apparatus and substrate treating method | Electricity | 0 | Active |
| US9802150B2 | Carbon dioxide absorbent based on amine having nitrile functional group, and carbon dioxide absorption method and separation method using same | Emerging Cross-Sectional Technologies | 0 | Active |
| US11981995B2 | Chemical supply apparatus, method for removing particles from chemical, nozzle unit, and substrate treating apparatus | Electricity | 0 | Active |
| US8927763B2 | Method for preparing aliphatic diisocyanate | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.