Method of generating a training set usable for examination of a semiconductor specimen and system thereof
US10832092B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2019 |
| Grant date | Nov 10, 2020 |
| Priority date | — |
| Expiry date | Feb 7, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
There is provided a method of examination of a semiconductor specimen. The method comprises: upon obtaining by a computer a Deep Neural Network (DNN) trained for a given examination-related application within a semiconductor fabrication process, processing together one or more fabrication process (FP) images using the obtained trained DNN, wherein the DNN is trained using a training set comprising synthetic images specific for the given application; and obtaining, by the computer, examination-related data specific for the given application, and characterizing at least one of the processed one or more FP images. Generating the training set can comprise: training an auxiliary DNN to generate a latent space, generating a synthetic image by applying the trained auxiliary DNN to a point selected in the generated latent space, and adding the generated synthetic image to the training set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.