Method and apparatus for precleaning a substrate surface prior to epitaxial growth
US10837122B2 · kind B2 · utility
0Cited by
11References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 26, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Aug 26, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.