Post exposure processing apparatus

US10845715B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Viachslav Babayan · Sunnyvale, US
• Ludovic Godet · Sunnyvale, US
• Kyle M. Hanson · Kalispell, US
• Robert B. Moore · Bigfork, US

Key dates

• Filing date: Aug 22, 2019
• Grant date: Nov 24, 2020
• Expiry date: Aug 22, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67248
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.