Viachslav Babayan
20Patents
5h-index
27Co-inventors
61Inventor score
Filing activity: Jun 8, 2015 → Sep 7, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9865484B1 | Selective etch using material modification and RF pulsing | Electricity | 109 | Active |
| US9964863B1 | Post exposure processing apparatus | Electricity | 14 | Active |
| US10203604B2 | Method and apparatus for post exposure processing of photoresist wafers | Electricity | 13 | Active |
| US9829790B2 | Immersion field guided exposure and post-exposure bake process | Physics | 10 | Active |
| US9958782B2 | Apparatus for post exposure bake | Electricity | 7 | Active |
| US10474033B2 | Method and apparatus for post exposure processing of photoresist wafers | Electricity | 3 | Active |
| US10615058B2 | Apparatus for field guided acid profile control in a photoresist layer | Electricity | 2 | Active |
| US11550224B2 | Apparatus for post exposure bake | Electricity | 1 | Active |
| US10401742B2 | Post exposure processing apparatus | Electricity | 1 | Active |
| US11262662B2 | Post exposure processing apparatus | Electricity | 1 | Active |
| US11112697B2 | Method and apparatus for post exposure processing of photoresist wafers | Electricity | 1 | Active |
| US11049701B2 | Biased cover ring for a substrate processing system | Electricity | 1 | Active |
| US12057329B2 | Selective etch using material modification and RF pulsing | Electricity | 0 | Active |
| US10858727B2 | High density, low stress amorphous carbon film, and process and equipment for its deposition | Electricity | 0 | Active |
| US10754252B2 | Apparatus for post exposure bake | Electricity | 0 | Active |
| US11094573B2 | Method and apparatus for thin wafer carrier | Chemistry; Metallurgy | 0 | Active |
| US10845715B2 | Post exposure processing apparatus | Electricity | 0 | Active |
| US10566177B2 | Pulse shape controller for sputter sources | Electricity | 0 | Active |
| US11899366B2 | Method and apparatus for post exposure processing of photoresist wafers | Electricity | 0 | Active |
| US10954594B2 | High temperature vapor delivery system and method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.