Displacement based overlay or alignment
US10852646B2 · kind B2 · utility
1Cited by
2References
21Claims
0Family size
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Key dates
| Filing date | Apr 20, 2017 |
| Grant date | Dec 1, 2020 |
| Priority date | — |
| Expiry date | Apr 29, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method including obtaining an image of a plurality of structures on a substrate, wherein each of the plurality of structures is formed onto the substrate by transferring a corresponding pattern of a design layout; obtaining, from the image, a displacement for each of the structures with respect to a reference point for that structure; and assigning each of the structures into one of a plurality of groups based on the displacement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.