Patent · US Active

Process window tracker

US10866523B2 · kind B2 · utility

0Cited by

4References

21Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Wim Tjibbo Tel · Helmond, NL
Frank Staals · Eindhoven, NL
Mark John Maslow · Eindhoven, NL

Key dates

Filing date	May 27, 2016
Grant date	Dec 15, 2020
Priority date	—
Expiry date	Sep 19, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/0274
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for adjusting a lithography process, wherein processing parameters of the lithography process include a first group of processing parameters and a second group of processing parameters, the method including: obtaining a change of the second group of processing parameters; determining a change of a sub-process window (sub-PW) as a result of the change of the second group of processing parameters, wherein the sub-PW is spanned by only the first group of processing parameters; and adjusting the first group of processing parameters based on the change of the sub-PW.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.