Metrology method and device
US10866526B2 · kind B2 · utility
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1References
22Claims
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Key dates
| Filing date | Sep 19, 2018 |
| Grant date | Dec 15, 2020 |
| Priority date | — |
| Expiry date | Feb 2, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8848
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection apparatus, including: an objective configured to receive diffracted radiation from a metrology target having positive and negative diffraction order radiation; an optical element configured to separate the diffracted radiation into portions separately corresponding to each of a plurality of different values or types of one or more radiation characteristics and separately corresponding to the positive and negative diffraction orders; and a detector system configured to separately and simultaneously measure the portions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.