Optical stack deposition and on-board metrology

US10886155B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Mingwei Zhu · Sunnyvale, US
• Zihao Yang · Santa Clara, US
• Nag B. Patibandla · Pleasanton, US
• Daniel Lee Diehl · Chiba, JP
• Yong Cao · Goleta, US
• Weimin Zeng · San Jose, US
• Renjing Zheng · San Jose, US
• Edward W. Budiarto · Fremont, US
• Surender Kumar Gurusamy · Santa Clara, US
• Todd Egan · Fremont, US
• Niranjan Ramchandra Khasgiwale · San Jose, US

Key dates

• Filing date: Jan 16, 2019
• Grant date: Jan 5, 2021
• Expiry date: Jan 27, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G05B2219/2602
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.