Solid precursor-based delivery of fluid utilizing controlled solids morphology

US10895010B2 · kind B2 · utility

Assignee

• ENTEGRIS, INC. · US

Inventors

• John M. Cleary · Bound Brook, US
• Jose I. Arno · Brookfield, US
• Bryan C. Hendrix · Danbury, US
• Donn K. Naito · Marble Falls, US
• Scott L. Battle · Cedar Park, US
• John N. Gregg · Marble Falls, US
• Michael J. Wodjenski · New Milford, US
• Chongying Xu · New Milford, US

Key dates

• Filing date: Oct 25, 2016
• Grant date: Jan 19, 2021
• Expiry date: Jan 16, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45544
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.