Pellicle manufacturing method and method for manufacturing photomask with pellicle
US10895805B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 26, 2017 |
| Grant date | Jan 19, 2021 |
| Priority date | — |
| Expiry date | Jun 23, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/80
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.