Patent · US Active

Electrostatic chuck assembly having a dielectric filler

US10930540B2 · kind B2 · utility

0Cited by
3References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 5, 2019
Grant dateFeb 23, 2021
Priority date
Expiry dateNov 5, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/20
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.