Evans Lee
22Patents
13h-index
55Co-inventors
84Inventor score
Filing activity: Dec 15, 1994 → Nov 5, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8496756B2 | Methods for processing substrates in process systems having shared resources | Electricity | 501 | Active |
| US6364957B1 | Support assembly with thermal expansion compensation | Electricity | 286 | Expired |
| US5605637A | Adjustable dc bias control in a plasma reactor | Electricity | 147 | Expired |
| US6916399B1 | Temperature controlled window with a fluid supply system | Electricity | 138 | Expired |
| US5891350A | Adjusting DC bias voltage in plasma chambers | Electricity | 96 | Expired |
| US6432259B1 | Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates | Electricity | 57 | Expired |
| US6192827A | Double slit-valve doors for plasma processing | Emerging Cross-Sectional Technologies | 56 | Expired |
| US6716302B2 | Dielectric etch chamber with expanded process window | Electricity | 48 | Expired |
| US6797639B2 | Dielectric etch chamber with expanded process window | Electricity | 36 | Expired |
| US6076482A | Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion | Electricity | 19 | Expired |
| US6221782A | Adjusting DC bias voltage in plasma chamber | Electricity | 17 | Expired |
| US7374636B2 | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor | Electricity | 14 | Expired |
| US6513452B2 | Adjusting DC bias voltage in plasma chamber | Electricity | 13 | Expired |
| US7147719B2 | Double slit-valve doors for plasma processing | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7294224B2 | Magnet assembly for plasma containment | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7316199B2 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber | Electricity | 6 | Expired |
| US6647918B1 | Double slit-valve doors for plasma processing | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6863835B1 | Magnetic barrier for plasma in chamber exhaust | Electricity | 4 | Expired |
| US8721798B2 | Methods for processing substrates in process systems having shared resources | Electricity | 2 | Active |
| US6773544B2 | Magnetic barrier for plasma in chamber exhaust | Electricity | 1 | Expired |
| US10504765B2 | Electrostatic chuck assembly having a dielectric filler | Electricity | 1 | Active |
| US10930540B2 | Electrostatic chuck assembly having a dielectric filler | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.