Patent · US Active

Diamond-like carbon as mandrel

US10954129B2 · kind B2 · utility

3Cited by
2References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 7, 2018
Grant dateMar 23, 2021
Priority date
Expiry dateJun 7, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/31144
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of fabricating a semiconductor structure is described. The method comprises forming at least one mandrel on a substrate, the at least one mandrel comprising a diamond-like carbon and having a top and two opposing sidewalls, the diamond-like carbon comprising at least 40% sp3 hybridized carbon atoms. The mandrel may be used in Self-Aligned Multiple Patterning (SAMP) processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.