Efficient metal-insulator-metal capacitor

US10978550B2 · kind B2 · utility

Assignee

• TESSERA LLC · US

Inventors

• Kisup Chung · Slingerlands, US
• Isabel C. Estrada-Raygoza · Albany, US
• Hemanth Jagannathan · Niskayuna, US
• Chi-Chun Liu · Altamont, US
• Yann Mignot · Slingerlands, US
• Hao Tang · Slingerlands, US

Key dates

• Filing date: May 11, 2020
• Grant date: Apr 13, 2021
• Expiry date: May 11, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D1/692

Abstract

A capacitor includes a stack. The stack has a first metallic layer formed over a substrate, an insulator formed over the first metallic layer, and a second metallic layer formed over the insulator. The first metallic layer has at least one high domain and at least one low domain, where a surface of the substrate in the at least one low domain has a height that is lower than a surface of the substrate in the at least one high domain.