Yann Mignot
28Patents
4h-index
29Co-inventors
55Inventor score
Filing activity: Jun 3, 2016 → Feb 14, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9991156B2 | Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs | Electricity | 14 | Active |
| US9691659B1 | Via and chamfer control for advanced interconnects | Electricity | 12 | Active |
| US9607886B1 | Self aligned conductive lines with relaxed overlay | Electricity | 6 | Active |
| US10475905B2 | Techniques for vertical FET gate length control | Electricity | 4 | Active |
| US9786554B1 | Self aligned conductive lines | Electricity | 4 | Active |
| US9773700B1 | Aligning conductive vias with trenches | Electricity | 3 | Active |
| US11610780B2 | Alternating hardmasks for tight-pitch line formation | Electricity | 2 | Active |
| US10090378B1 | Efficient metal-insulator-metal capacitor | Electricity | 2 | Active |
| US10580652B2 | Alternating hardmasks for tight-pitch line formation | Emerging Cross-Sectional Technologies | 1 | Active |
| US10957583B2 | Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs | Electricity | 1 | Active |
| US10651266B2 | Efficient metal-insulator-metal capacitor | Electricity | 1 | Active |
| US11031248B2 | Alternating hardmasks for tight-pitch line formation | Electricity | 1 | Active |
| US10546774B2 | Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs | Electricity | 1 | Active |
| US9852946B1 | Self aligned conductive lines | Electricity | 1 | Active |
| US11164772B2 | Spacer-defined process for lithography-etch double patterning for interconnects | Electricity | 0 | Active |
| US10395985B2 | Self aligned conductive lines with relaxed overlay | Electricity | 0 | Active |
| US11600519B2 | Skip-via proximity interconnect | Electricity | 0 | Active |
| US10978576B2 | Techniques for vertical FET gate length control | Electricity | 0 | Active |
| US10083864B2 | Self aligned conductive lines with relaxed overlay | Electricity | 0 | Active |
| US9911647B2 | Self aligned conductive lines | Electricity | 0 | Active |
| US11075161B2 | Large via buffer | Electricity | 0 | Active |
| US10062605B2 | Via and chamfer control for advanced interconnects | Electricity | 0 | Active |
| US10714389B2 | Structure and method using metal spacer for insertion of variable wide line implantation in SADP/SAQP integration | Electricity | 0 | Active |
| US9972533B2 | Aligning conductive vias with trenches | Electricity | 0 | Active |
| US10256289B2 | Efficient metal-insulator-metal capacitor fabrication | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.