Mask assembly
US11009803B2 · kind B2 · utility
0Cited by
20References
18Claims
0Family size
Assignees
Inventors
- Matthias Kruizinga
- Maarten Mathijs Marinus Jansen
- Jorge Manuel Azeredo Lima
- Erik Willem Bogaart
- Derk Servatius Gertruda Brouns
- Marc Bruijn
- Richard Joseph Bruls
- Jeroen Dekkers
- Paul Janssen
- Mohammad Reza KAMALI
- Ronald Harm Gunther Kramer
- Robert Gabriël Maria Lansbergen
- Martinus Hendrikus Antonius Leenders
- Matthew Lipson
- Erik Roelof Loopstra
- Joseph H. Lyons
- Stephen Roux
- Gerrit Van Den Bosch
- Sander Van Den Heijkant
- Sandra Van Der Graaf
- Frits Van Der Meulen
- Jérôme François Sylvain Virgile Van Loo
- Beatrijs Louise Marie-Joseph Katrien Verbrugge
Key dates
| Filing date | Sep 30, 2019 |
| Grant date | May 18, 2021 |
| Priority date | — |
| Expiry date | Nov 15, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70825
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.