Lithographic method
US11029610B2 · kind B2 · utility
Assignee
Inventors
- Patricius Aloysius Jacobus Tinnemans
- Edo Maria Hulsebos
- Henricus Johannes Lambertus Megens
- Ahmet Koray Erdamar
- Loek Johannes Petrus Verhees
- Willem Seine Christian Roelofs
- Wendy Johanna Martina Van De Ven
- Hadi YAGUBIZADE
- Hakki Ergün Cekli
- Ralph Brinkhof
- Tran Thanh Thuy VU
- Maikel Robert GOOSEN
- Maaike Van T Westeinde
- Weitian Kou
- Manouk RIJPSTRA
- Matthijs Cox
- Franciscus Godefridus Casper Bijnen
Key dates
| Filing date | Sep 4, 2018 |
| Grant date | Jun 8, 2021 |
| Priority date | — |
| Expiry date | Sep 4, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7073
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.