Weitian Kou
12Patents
2h-index
43Co-inventors
46Inventor score
Filing activity: Sep 21, 2016 → Jan 24, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10527958B2 | Lithographic method | Physics | 6 | Active |
| US11054813B2 | Method and apparatus for controlling an industrial process using product grouping | Emerging Cross-Sectional Technologies | 2 | Active |
| US11029610B2 | Lithographic method | Physics | 1 | Active |
| US11448973B2 | Computational metrology based correction and control | Emerging Cross-Sectional Technologies | 1 | Active |
| US12124179B2 | Method of wafer alignment using at resolution metrology on product features | Physics | 0 | Active |
| US11592753B2 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Physics | 0 | Active |
| US12044981B2 | Method and apparatus for optimization of lithographic process | Emerging Cross-Sectional Technologies | 0 | Active |
| US11782349B2 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Physics | 0 | Active |
| US11327407B2 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Physics | 0 | Active |
| US11099487B2 | Method and apparatus for optimization of lithographic process | Emerging Cross-Sectional Technologies | 0 | Active |
| US10962887B2 | Lithographic method | Physics | 0 | Active |
| US10877381B2 | Methods of determining corrections for a patterning process | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.