Patent · US Active

In-situ integrated chambers

US11037838B2 · kind B2 · utility

0Cited by

13References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Xuebin Li · Santa Clara, US
Schubert S. Chu · San Francisco, US
Errol Antonio C. Sanchez · Tracy, US
Patricia M. Liu · Saratoga, US
Gaurav Thareja · Santa Clara, US
Raymond Hung · Palo Alto, US

Key dates

Filing date	Sep 3, 2019
Grant date	Jun 15, 2021
Priority date	—
Expiry date	Sep 3, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH10D84/038
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as capping and nitridation. The cluster tool can include one or more process chambers configured to form a source and a drain. The devices fabricated in the cluster tool are fabricated to have at least one protective layer formed over the metal-silicide or metal-germanide film to protect the film from contamination during handling and transfer to separate systems.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.