Patent · US Active

Wafer processing method

US11043421B2 · kind B2 · utility

0Cited by
0References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 5, 2019
Grant dateJun 22, 2021
Priority date
Expiry dateAug 5, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2221/6834
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer processing method includes a polyester sheet providing step of positioning a wafer in an inside opening of a ring frame and providing a polyester sheet on a back side of the wafer and on a back side of the ring frame, a uniting step of heating the polyester sheet as applying a pressure to the polyester sheet to thereby unite the wafer and the ring frame through the polyester sheet by thermocompression bonding, a dividing step of cutting the wafer by using a cutting apparatus to thereby divide the wafer into individual device chips, and a pickup step of cooling the polyester sheet, pushing up each device chip through the polyester sheet, and then picking up each device chip from the polyester sheet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.