Substrate carrier having hard mask

US11047039B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Alexander Lerner · Carmiel, IL
• Kim Vellore · San Jose, US
• Ami Sade · Nahariah, IL
• Steven V. Sansoni · Livermore, US
• Andrew J. Constant · Cupertino, US
• Kevin Moraes · Fremont, US
• Roey Shaviv · Palo Alto, US
• Niranjan Kumar · Bengaluru, IN
• Jeffrey A. Brodine · Los Gatos, US
• Michael P. Karazim · San Jose, US

Key dates

• Filing date: Dec 26, 2018
• Grant date: Jun 29, 2021
• Expiry date: Sep 25, 2039

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/24
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.