Multi-port gas injection system and reactor system including same
US11053591B2 · kind B2 · utility
2Cited by
1,994References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 6, 2018 |
| Grant date | Jul 6, 2021 |
| Priority date | — |
| Expiry date | Feb 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.