Methods and apparatuses for coating photoresist

US11061330B2 · kind B2 · utility

Assignee

• Institute of Optics and Electronics, Chinese Academy of Sciences · CN

Inventors

• Xiangang Luo · Fremont, US
• Yanqin WANG · Sichuan, CN
• Zeyu Zhao · Sichuan, CN
• Mingbo Pu · Chengdu, CN
• Ping Gao · Hong Kong, CN
• Xiaoliang Ma · Port Matilda, US
• Xiong Li · Allen, US
• Yinghui Guo · Beijing, CN

Key dates

• Filing date: Feb 10, 2017
• Grant date: Jul 13, 2021
• Expiry date: Feb 10, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6719
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.