Method and system for determining a charged particle beam exposure for a local pattern density
US11062878B2 · kind B2 · utility
3Cited by
21References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2020 |
| Grant date | Jul 13, 2021 |
| Priority date | — |
| Expiry date | Jul 21, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes determining a local pattern density for the area of the pattern based on an original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PLC maximum dose.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.