Surface treatment of silicon or silicon germanium surfaces using organic radicals
US11062910B2 · kind B2 · utility
4Cited by
11References
18Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jun 18, 2019 |
| Grant date | Jul 13, 2021 |
| Priority date | — |
| Expiry date | Jun 18, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include performing an organic radical based surface treatment process on a workpiece. The organic radical based surface treatment process can include generating one or more species in a first chamber. The surface treatment process can include mixing one or more hydrocarbon molecules with the species to create a mixture. The mixture can include one or more organic radicals. The surface treatment process can include exposing a semiconductor material on the workpiece to the mixture in a second chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.