Method of classifying defects in a semiconductor specimen and system thereof
US11151706B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 16, 2019 |
| Grant date | Oct 19, 2021 |
| Priority date | — |
| Expiry date | Jan 14, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system, method and computer readable medium for classifying defects, the method comprising: receiving classified first defects, and potential defects, each first and potential defect having values for attributes; processing the first and potential defects to select a subset of the attributes that differentiates the first defects from the potential defects; obtaining first and second functions based on the first defects and potential defects, respectively; obtaining a first threshold for the first function, and a second threshold for a combination of the first and second functions; applying the first function and the second function to each potential defect to obtain first and second scores, respectively; and determining a combined score of the first and second scores; and indicating as a defect of a potentially new type a potential defect when the first score is lower than the first threshold or the combined score exceeds the second threshold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.