Generation of hydrogen reactive species for processing of workpieces
US11164725B2 · kind B2 · utility
1Cited by
12References
13Claims
0Family size
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Key dates
| Filing date | May 23, 2019 |
| Grant date | Nov 2, 2021 |
| Priority date | — |
| Expiry date | May 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31138
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods, systems, and apparatus for generating hydrogen radicals for processing a workpiece, such as a semiconductor workpiece, are provided. In one example implementation, a method can include generating one or more species in a plasma chamber from an inert gas by inducing a plasma in the inert gas using a plasma source; mixing hydrogen gas with the one or more species to generate one or more hydrogen radicals; and exposing the workpiece in a processing chamber to the one or more hydrogen radicals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.