Method and apparatus for inspection and metrology
US11170072B2 · kind B2 · utility
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2References
21Claims
0Family size
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Key dates
| Filing date | Mar 25, 2016 |
| Grant date | Nov 9, 2021 |
| Priority date | — |
| Expiry date | Apr 30, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.