Purged viewport for quartz dome in epitaxy reactor
US11189508B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Sep 24, 2019 |
| Grant date | Nov 30, 2021 |
| Priority date | — |
| Expiry date | Sep 24, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K11/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Embodiments described herein generally relate to an in-situ metrology system that can constantly provide an uninterrupted optical access to a substrate disposed within a process chamber. In one embodiment, a metrology system for a substrate processing chamber is provided. The metrology system includes a sensor view pipe coupling to a quartz dome of a substrate processing chamber, a flange extending radially from an outer surface of the sensor view pipe, and a viewport window disposed on the flange, the viewport window having spectral ranges chosen for an optical sensor that is disposed on or adjacent to the viewport window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.