Generating a training set usable for examination of a semiconductor specimen

US11199506B2 · kind B2 · utility

Assignee

• Applied Materials Israel Ltd. · IL

Inventors

• Ohad Shaubi · Yavne, IL
• Assaf Asbag · Gdera, IL
• Boaz Cohen · al-Araqeeb, IL

Key dates

• Filing date: Feb 20, 2019
• Grant date: Dec 14, 2021
• Expiry date: Oct 9, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L22/12
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

There is provided a system and method of generating a training set usable for examination of a semiconductor specimen. The method comprises: obtaining a simulation model capable of simulating effect of a physical process on fabrication process (FP) images depending on the values of parameters of the physical process; applying the simulation model to an image to be augmented for the training set and thereby generating one or more augmented images corresponding to one or more different values of the parameters of the physical process; and including the generated one or more augmented images into the training set. The training set can be usable for examination of the specimen using a trained Deep Neural Network, automated defect review, automated defect classification, automated navigation during the examination, automated segmentation of FP images, automated metrology based on FP images and other examination processes that include machine learning.