Patent · US Active

Methods of producing slanted gratings with variable etch depths

US11226441B2 · kind B2 · utility

2Cited by

2References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Morgan Evans · Attleboro, US
Rutger Meyer Timmerman Thijssen · Sunnyvale, US
Joseph C. Olson · Beverly, US

Key dates

Filing date	Oct 16, 2020
Grant date	Jan 18, 2022
Priority date	—
Expiry date	Oct 16, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG02B6/0026
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.