Patent · US Active

Substrate processing apparatus and method

US11230766B2 · kind B2 · utility

3Cited by

2,096References

13Claims

0Family size

Assignee

ASM IP Holding B.V. · NL

Inventors

Dieter Pierreux · Dilbeek, BE
Cornelis Thaddeus Herbschleb · Leiden, NL
Werner Knaepen · Leuven, BE
Bert Jongbloed · Oud-Heverlee, BE
Steven R. A. Van Aerde · Tielt-Winge, BE
Kelly Houben · Sint-Bernard, BE
Theodorus G.M. Oosterlaken · Oudewater, NL
Chris G. M. de Ridder · Almere, NL
Lucian Jdira · Nieuw-Vennep, NL

Key dates

Filing date	Mar 29, 2018
Grant date	Jan 25, 2022
Priority date	—
Expiry date	Jul 29, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32339
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.